International Workshop on Fine Art Pattern Extraction and Recognition Call for Papers


                    FAPER2020 workshop at ICPR2020
         *** UPDATES in relation to COVID-19 (Coronavirus) ***


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 International Workshop on Fine Art Pattern Extraction and Recognition
                          F A P E R   2 0 2 0

                    workshop in conjunction with the
    25th International Conference on Pattern Recognition (ICPR2020)
                   Milan, Italy, January 10-15, 2021

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             *** Submission deadline: October 15, 2020 ***

- Submission link: -

=== UPDATES in relation to COVID-19 (Coronavirus) ===

Given the COVID-19 situation in Italy and all over the globe, the ICPR
2020 Chairs have decided to shift the Conference schedule, including
FAPER2020, to the beginning of January 2021.

FAPER2020 submission deadline has been postponed as well to October 10th, 2020.

=== Aim & Scope ===

Cultural heritage, in particular fine art, has invaluable importance
for the cultural, historic, and economic growth of our societies. Fine
art is developed primarily for aesthetic purposes, and it is mainly
concerned with paintings, sculptures, and architectures. In the last
few years, due to technology improvements and drastically declining
costs, a large-scale digitization effort has been made, leading to a
growing availability of large digitized fine art collections. This
availability, along with the recent advancements in pattern
recognition and computer vision, has opened new opportunities for
computer science researchers to assist the art community with
automatic tools to analyse and further understand fine arts. Among the
other benefits, a deeper understanding of fine arts has the potential
to make them more accessible to a wider population, both in terms of
fruition and creation, thus supporting the spread of culture.

The ability to recognize meaningful patterns in fine art inherently
falls within the domain of human perception, and this perception can
be extremely hard to conceptualize. Thus, visual-related features,
such as those automatically learned by deep learning models, can be
the key to tackling problems of extracting useful representations from
low-level colour and texture features. These representations can
assist in various art-related tasks, ranging from object detection in
paintings to artistic style categorization, useful for examples in
museum and art gallery websites.

The aim of the workshop is to provide an international forum for those
who wish to present advancements in the state of the art, innovative
research, ongoing projects, and academic and industrial reports on the
application of visual pattern extraction and recognition for the
better understanding and fruition of fine arts. The workshop solicits
contributions from diverse areas such as pattern recognition, computer
vision, artificial intelligence and image processing.

=== Topics ===

Topics of interest include, but are not limited to:
- Application of machine learning and deep learning to cultural heritage
- Computer vision and multimedia data
- Generative adversarial networks for artistic data
- Augmented and virtual reality for cultural heritage
- 3D reconstruction of historical artifacts
- Historical document analysis
- Content-based retrieval in the art domain
- Speech, audio and music analysis from historical archives
- Digitally enriched museum visits
- Smart interactive experiences in cultural sites
- Projects, products or prototypes for cultural heritage restoration, preservation and fruition

=== Important Dates ===

-  October  10th, 2020 - workshop submission deadline
-  November 10th, 2020 - author notification
-  November 15th, 2020 - camera-ready submission
-  December  1st, 2020 - finalized workshop program

=== Submission guidelines ===

Submissions must be formatted in accordance with the Springer's
Computer Science Proceedings guidelines. The following paper
categories are welcome:
- Full papers (12-15 pages, including references)
- Short papers  (6-8 pages, including references)

Accepted manuscripts will be included in the ICPR 2020 Workshop
Proceedings Springer volume. Once accepted, at least one author is
expected to attend the event and orally present the paper. Authors of
selected papers will be invited to extend and improve their
contributions for a Special Issue of the Journal of Imaging (MDPI).

=== Organizing committee ===

Gennaro Vessio (University of Bari, Italy)
Giovanna Castellano (University of Bari, Italy)
Fabio Bellavia (University of Palermo, Italy)

=== Venue ===

The workshop will be hosted at Milan Congress Center (Mi.Co.), which
is located in Piazzale Carlo Magno 1, Milan, Italy.